Electron Beam Lithography skill for high-resolution nanopatterning with dose optimization and proximity effect correction
The EBL Process Controller skill provides comprehensive electron beam lithography process control, enabling high-resolution nanopatterning through dose optimization, proximity effect correction, and critical dimension control.
Pattern Preparation
Dose Optimization
Process Integration
{
"pattern_file": "string",
"resist": "string",
"thickness": "number (nm)",
"target_cd": "number (nm)",
"beam_voltage": "number (kV)",
"beam_current": "number (pA)"
}
{
"optimized_dose": "number (uC/cm2)",
"pec_parameters": {
"alpha": "number",
"beta": "number",
"eta": "number"
},
"write_time": "number (hours)",
"expected_cd": "number (nm)",
"cd_uniformity": "number (3sigma)"
}