Atomic Layer Deposition skill for conformal thin film deposition with atomic-level thickness control
The ALD Process Controller skill provides comprehensive atomic layer deposition process control, enabling conformal thin film growth with atomic-level precision through optimized pulse sequences and in-situ monitoring.
Saturation Studies
Process Window
Film Quality
{
"material": "string",
"precursor_a": "string",
"precursor_b": "string",
"target_thickness": "number (nm)",
"substrate": "string",
"temperature": "number (C)"
}
{
"optimized_recipe": {
"precursor_a_pulse": "number (s)",
"purge_a": "number (s)",
"precursor_b_pulse": "number (s)",
"purge_b": "number (s)"
},
"gpc": "number (Angstrom/cycle)",
"cycles_required": "number",
"uniformity": "number (%)",
"conformality": "number (% step coverage)"
}