Cds Layer Deposition Optimization

Key Insight: Final cell efficiency is remarkably insensitive to deposition method choice after careful recrystallization.

Thickness Specifications

• Typical range: 30-80nm
• Standard value: ~60nm
• Recrystallization: May be required before CdTe deposition in some cases

Optimization Strategy

Balance two competing factors:

1. Open circuit voltage (Voc): INCREASES with CdS thickness due to better junction formation and coverage
2. Short circuit current (jsc): DECREASES with CdS thickness due to additional absorption of optically active light

CdS absorbs blue/UV photons that cannot contribute to CdTe photocurrent.

Target: Find minimum thickness that still provides good Voc.

Execution Steps

1. Select deposition method based on equipment availability and process requirements
2. Deposit initial CdS layer at ~60nm thickness
3. Evaluate Voc and jsc performance
4. Adjust thickness based on trade-off analysis:
   • If Voc is insufficient: Increase thickness
   • If jsc is insufficient: Decrease thickness
5. Iterate to find optimal balance point

Variables

• CdS_thickness: Layer thickness in nm (range: 30-80nm)
• Voc: Open circuit voltage (increases with CdS thickness)
• jsc: Short circuit current (decreases with CdS thickness)

Expected Output

Optimized CdS thickness value that balances Voc and jsc requirements for maximum cell efficiency.3b:["$","$L43",null,{"content":"$44","frontMatter":{"name":"cds-layer-deposition-optimization","description":"Optimize CdS window layer deposition and thickness for CdS/CdTe solar cells. Use when designing or fabricating CdS/CdTe cells to balance Voc and jsc trade-offs."}}]